Blank Cover Image

Characteristics analysis of polarization module on optical proximity effect

Author(s):
C. Park ( Hynix Semiconductor, Inc. (South Korea) )
J. Hong ( Hynix Semiconductor, Inc. (South Korea) )
K. Yang ( Hynix Semiconductor, Inc. (South Korea) )
T. Theeuwes ( ASML (Netherlands) )
F. Gautier ( ASML (Netherlands) )
Y. Min ( ASML TDC Asia (Taiwan) )
A. Chen ( ASML TDC Asia (Taiwan) )
H. Yang ( Hynix Semiconductor, Inc. (South Korea) )
D. Yim ( Hynix Semiconductor, Inc. (South Korea) )
J. Kim ( Hynix Semiconductor, Inc. (South Korea) )
5 more
Publication title:
Optical microlithography XX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6520
Pub. Year:
2007
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819466396 [0819466395]
Language:
English
Call no.:
P63600/6520
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Aberration sensitivity control for the isolation layer in low-k1 DRAM process

Cho, B.-H., Yim, D., Park, C.-H., Lee, S.-H., Yang, H.-J., Choi, J.-H., Shin, Y.-C., Kim, C.-D., Choi, J.-S., Kang, …

SPIE-The International Society for Optical Engineering
7 Conference Proceedings Particle Size Characteristics of Molten Corium Quenched in Water

B. T. Min, H. D. Kim, J. H. Kim, S. W. Hong, I. K. Park

American Society of Mechanical Engineers
2 Conference Proceedings Characterizing optical proximity effect difference among exposure tools [6152-103]

Hong, J., Lee, J., Kang, E., Yang, H., Yim, D., Kim, J.

SPIE - The International Society of Optical Engineering
8 Conference Proceedings CD control at low K1 optical lithography in DRAM device

Hong, J., Woo, C., Park, J., Cho, B., Choi, J.-S., Yang, H., Park, C., Shin, Y.-C., Kim, Y., Jeong, G., Kim, J., Kang, …

SPIE-The International Society for Optical Engineering
3 Conference Proceedings A high-frame-rate DUV-optimized CCD for simultaneous measurements of illumination intensity, polarization amplitude, and polarization direction for very high NA …

Yim, D., Yang, H., Park, C., Hong, J., Choi, J.

SPIE - The International Society of Optical Engineering
9 Conference Proceedings Optical detection of the superconducting proximity effect

Greene,L.H., Abeyta,A.C., Roshchin,I.V., Robinson,I.K., Dorsten,J.F., Tanzer,T.A., Bohn,P.W.

SPIE-The International Society for Optical Engineering
4 Conference Proceedings CD uniformity improvement by active scanner corrections

van Schoot, J.B., Noordman, O., Vanoppen, P., Blok, F., Yim, D., Park, C.-H., Cho, B.-H., Theeuwes, T., Min, Y.-H.

SPIE-The International Society for Optical Engineering
10 Conference Proceedings Analysis of pattern density on process proximity compensation

S. Jung, F. Lo, T. Yang, K. Chen, C. Lu

SPIE - The International Society of Optical Engineering
5 Conference Proceedings High NA polarized light lithography for O.29kl process [6154-15]

Park, C., Lee, J., Yang, K., Tseng, S., Min, Y.-H, Yang, H., Yim, D., Kim, J.

SPIE - The International Society of Optical Engineering
11 Conference Proceedings How to obtain accurate resist simulations in very low-kl era- [6154-107]

Chiou T. B, Park C. H, Choi, J. S, Min Y.-H, Hansen S, Tseng S. E, Chen A C, Yim D

SPIE - The International Society of Optical Engineering
6 Conference Proceedings The improvement of DOF for sub-1OOnm process by focus scan [6154-56]

Kim, J. C., Yang, H. J., Jeon J.-H, Park C.-H, Moon, J, Yim D, Kim J. W, Tseng S, Rhe K.-K, Min Y.-H, Chen A C

SPIE - The International Society of Optical Engineering
12 Conference Proceedings Suppression Features of a Vapor Explosion With Prototypic Reactor Materials

S. W. Hong, J. H. Kim, B. T. Min, I. K. Park, H. D. Kim

American Society of Mechanical Engineers
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12