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Characteristics analysis of polarization module on optical proximity effect

Author(s):
C. Park ( Hynix Semiconductor, Inc. (South Korea) )
J. Hong ( Hynix Semiconductor, Inc. (South Korea) )
K. Yang ( Hynix Semiconductor, Inc. (South Korea) )
T. Theeuwes ( ASML (Netherlands) )
F. Gautier ( ASML (Netherlands) )
Y. Min ( ASML TDC Asia (Taiwan) )
A. Chen ( ASML TDC Asia (Taiwan) )
H. Yang ( Hynix Semiconductor, Inc. (South Korea) )
D. Yim ( Hynix Semiconductor, Inc. (South Korea) )
J. Kim ( Hynix Semiconductor, Inc. (South Korea) )
5 more
Publication title:
Optical microlithography XX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6520
Pub. date:
2007
Vol.:
6520
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819466396 [0819466395]
Language:
English
Call no.:
P63600/6520
Type:
Conference Proceedings

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