Immersion defect reduction, part I: analysis of water leaks in an immersion scanner
- Author(s):
F. Liang ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) ) H. Chang ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) ) L. Shiu ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) ) C. Chen ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) ) L. Chen ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) ) T. Gau ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) ) B. J. Lin ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) ) - Publication title:
- Optical microlithography XX
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6520
- Pub. Year:
- 2007
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819466396 [0819466395]
- Language:
- English
- Call no.:
- P63600/6520
- Type:
- Conference Proceedings
Similar Items:
1
Conference Proceedings
Immersion defect reduction, part II: the formation mechanism and reduction of patterned defects
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
8
Conference Proceedings
Patterning fidelity on low-energy multiple-electron-beam direct write lithography
Society of Photo-optical Instrumentation Engineers |
3
Conference Proceedings
Study of line edge roughness using continuous wavelet transform for 65-nm node
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
4
Conference Proceedings
Study of mask corner rounding effects on lithographic patterning for 90-nm technology node and beyond
SPIE - The International Society of Optical Engineering |
10
Conference Proceedings
Defect dispositiong using mask printability analysis on alternating phase-shifting masks
SPIE-The International Society for Optical Engineering |
5
Conference Proceedings
Optimal positions for SB assignment and the specification of SB width variation
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
12
Conference Proceedings
Photomask defect tracing, analysis, and reduction with chemically amplified resist process
SPIE-The International Society for Optical Engineering |