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Transistor-based electrical test structures for lithography and process characterization

Author(s):
W. J. Poppe ( Univ. of California/Berkeley (USA) )
J. Holwill ( Univ. of California/Berkeley (USA) )
L. Pang ( Univ. of California/Berkeley (USA) )
P. Friedberg ( Univ. of California/Berkeley (USA) )
Q. Liu ( Univ. of California/Berkeley (USA) )
L. Alarcon ( Univ. of California/Berkeley (USA) )
A. Neureuther ( Univ. of California/Berkeley (USA) )
2 more
Publication title:
Optical microlithography XX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6520
Pub. Year:
2007
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819466396 [0819466395]
Language:
English
Call no.:
P63600/6520
Type:
Conference Proceedings

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