A solid-state 193-nm laser with high spatial coherence for sub-40-nm interferometric immersion lithography
- Author(s):
A. J. Merriam ( Actinix (USA) ) D. S. Bethune ( IBM Almaden Research Ctr. (USA) ) J. A. Hoffnagle ( IBM Almaden Research Ctr. (USA) ) W. D. Hinsberg ( IBM Almaden Research Ctr. (USA) ) C. M. Jefferson ( IBM Almaden Research Ctr. (USA) ) J. J. Jacob ( Actinix (USA) ) T. Litvin ( Kimokeo, Inc. (USA) ) - Publication title:
- Optical microlithography XX
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6520
- Pub. Year:
- 2007
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819466396 [0819466395]
- Language:
- English
- Call no.:
- P63600/6520
- Type:
- Conference Proceedings
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