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A solid-state 193-nm laser with high spatial coherence for sub-40-nm interferometric immersion lithography

Author(s):
A. J. Merriam ( Actinix (USA) )
D. S. Bethune ( IBM Almaden Research Ctr. (USA) )
J. A. Hoffnagle ( IBM Almaden Research Ctr. (USA) )
W. D. Hinsberg ( IBM Almaden Research Ctr. (USA) )
C. M. Jefferson ( IBM Almaden Research Ctr. (USA) )
J. J. Jacob ( Actinix (USA) )
T. Litvin ( Kimokeo, Inc. (USA) )
2 more
Publication title:
Optical microlithography XX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6520
Pub. Year:
2007
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819466396 [0819466395]
Language:
English
Call no.:
P63600/6520
Type:
Conference Proceedings

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