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Verification of high-transmittance PSM with polarization at 193-nm high-NA system

Author(s):
C. F. Chiu ( NANYA Technology Corp. (Taiwan) )
C. L. Chen ( NANYA Technology Corp. (Taiwan) )
J. W. Lee ( NANYA Technology Corp. (Taiwan) )
W. B. Wu ( NANYA Technology Corp. (Taiwan) )
C. L. Shih ( NANYA Technology Corp. (Taiwan) )
F. Y. Chen ( NANYA Technology Corp. (Taiwan) )
J. P. Lin ( NANYA Technology Corp. (Taiwan) )
2 more
Publication title:
Optical microlithography XX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6520
Pub. Year:
2007
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819466396 [0819466395]
Language:
English
Call no.:
P63600/6520
Type:
Conference Proceedings

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