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A method for generating assist-features in full-chip scale and its application to contact layers of sub-70nm DRAM devices

Author(s):
D. Park ( SAMSUNG Electronics Co., Ltd. (South Korea) )
S. Kim ( SAMSUNG Electronics Co., Ltd. (South Korea) )
C. Hwang ( SAMSUNG Electronics Co., Ltd. (South Korea) )
S. Lee ( SAMSUNG Electronics Co., Ltd. (South Korea) )
H. Cho ( SAMSUNG Electronics Co., Ltd. (South Korea) )
J. Moon ( SAMSUNG Electronics Co., Ltd. (South Korea) )
1 more
Publication title:
Optical microlithography XX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6520
Pub. date:
2007
Vol.:
6520
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819466396 [0819466395]
Language:
English
Call no.:
P63600/6520
Type:
Conference Proceedings

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