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Integration of a new alignment sensor for advanced technology nodes

Author(s):
P. Hinnen ( ASML Netherlands B.V. (Netherlands) )
J. Depre ( ASML Japan Co., Ltd. (Japan) )
S. Tanaka ( ASML Japan Co., Ltd. (Japan) )
S. Lim ( ASML Netherlands B.V. (Netherlands) )
O. Brioso ( ASML Netherlands B.V. (Netherlands) )
M. Shahrjerdy ( ASML Netherlands B.V. (Netherlands) )
K. Ishigo ( Toshiba Corp. (Japan) )
T. Kono ( Toshiba Corp. (Japan) )
T. Higashiki ( Toshiba Corp. (Japan) )
4 more
Publication title:
Optical microlithography XX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6520
Pub. date:
2007
Vol.:
6520
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819466396 [0819466395]
Language:
English
Call no.:
P63600/6520
Type:
Conference Proceedings

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