Performance of a 1.35NA ArF immersion lithography system for 40-nm applications

Performance of a 1.35NA ArF immersion lithography system for 40-nm applications

Author(s):

J. de Klerk ( ASML Netherlands B.V. (Netherlands) )

C. Wagner ( ASML Netherlands B.V. (Netherlands) )

R. Droste ( ASML Netherlands B.V. (Netherlands) )

L. Levasier ( ASML Netherlands B.V. (Netherlands) )

L. Jorritsma ( ASML Netherlands B.V. (Netherlands) )

E. van Setten ( ASML Netherlands B.V. (Netherlands) )

H. Kattouw ( ASML Netherlands B.V. (Netherlands) )

J. Jacobs ( ASML Netherlands B.V. (Netherlands) )

T. Heil ( Carl Zeiss SMT AG (Germany) )

4 more

Publication title:

Optical microlithography XX

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6520

Pub. date:

2007

Vol.:

6520

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819466396 [0819466395]

Language:

English

Call no.:

P63600/6520

Type:

Conference Proceedings

Details

TDL ID:	ZA00046827
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Optical Microlithography
Conf. info. (Number):	2007 : 20th
Conf. info. (Venue):	San Jose, CA, USA
Conf. info. (Date):	2007.02.27-2007.03.02

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