Blank Cover Image

Performance of a 1.35NA ArF immersion lithography system for 40-nm applications

Author(s):
J. de Klerk ( ASML Netherlands B.V. (Netherlands) )
C. Wagner ( ASML Netherlands B.V. (Netherlands) )
R. Droste ( ASML Netherlands B.V. (Netherlands) )
L. Levasier ( ASML Netherlands B.V. (Netherlands) )
L. Jorritsma ( ASML Netherlands B.V. (Netherlands) )
E. van Setten ( ASML Netherlands B.V. (Netherlands) )
H. Kattouw ( ASML Netherlands B.V. (Netherlands) )
J. Jacobs ( ASML Netherlands B.V. (Netherlands) )
T. Heil ( Carl Zeiss SMT AG (Germany) )
4 more
Publication title:
Optical microlithography XX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6520
Pub. date:
2007
Vol.:
6520
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819466396 [0819466395]
Language:
English
Call no.:
P63600/6520
Type:
Conference Proceedings

Similar Items:

Klerk, J., Jorritsma, L., Setten, E., Droste, R., Jongh, R.C., Hansen, S.G., Smith, D., Kerkhof, M.A., Mast, F., …

SPIE-The International Society for Optical Engineering

A. J. Merriam, D. S. Bethune, J. A. Hoffnagle, W. D. Hinsberg, C. M. Jefferson, J. J. Jacob, T. Litvin

SPIE - The International Society of Optical Engineering

J. Mulkens, B. Streefkerk, H. Jasper, J. de Klerk, F. de Jong, L. Levasier, M. Leenders

SPIE - The International Society of Optical Engineering

Choi, S.-H., Park, T.-H., Kim, E., Youn, H.-J., Lee, D.-Y., Ban, Y.-C., Je, A.-Y., Kim, D.-H., Hong, J.-S., Kim, Y.-H., …

SPIE - The International Society of Optical Engineering

Kohler, C., de Boeij, W., van Ingen-Schenau, K., van de Kerkhof, M., de Klerk, J., Kok, H., Swinkels, G., Finders, J., …

SPIE - The International Society of Optical Engineering

Nagahara, S., Pollentier, I., Machida, T., O’Brien, S., Jacobs, E., Schaap, C., Leroy, P., Storms, G., Nafus, K., …

SPIE - The International Society of Optical Engineering

T. Uchiyama, T. Tamura, K. Yoshimochi, P. Graupner, H. Bakker, E. van Setten, K. Morisaki

SPIE - The International Society of Optical Engineering

Lee, C. H., Han, S., Park, K. S., Kang, H. Y., Oh, H. W., Lee, J. E., Kim, K. M., Kim, Y. H., Kim, T. S., Oh, H.-K.

SPIE - The International Society of Optical Engineering

K. Yoshimura, H. Nakano, H. Hata, N. Deguchi, M. Kobayashi

Society of Photo-optical Instrumentation Engineers

Sluijk,B., Castenmiller,T., Jongh,R.du Croo de, Jasper,H., Modderman,T., Levasier,L., Loopstra,E., Savenije,G., …

SPIE-The International Society for Optical Engineering

6 Conference Proceedings Liquid immersion lithography at 157 nm

Chen, C.-K., Gau, T.-S., Shiu, L.-H., Lin, B. J.

SPIE - The International Society of Optical Engineering

R. Zhang, A. G. Timko, L. Pylneva, J. Loch, H. Wu

Society of Photo-optical Instrumentation Engineers

1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12