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High-index immersion lithography with second-generation immersion fluids to enable numerical aperatures of 1.55 for cost effective 32-nm half pitches

Author(s):
R. H. French ( DuPont Co. (USA) )
V. Liberman ( MIT Lincoln Lab (USA) )
H. V. Tran ( DuPont Co. (USA) )
J. Feldman ( DuPont Co. (USA) )
D. J. Adelman ( DuPont Co. (USA) )
R. C. Wheland ( DuPont Co. (USA) )
W. Qiu ( DuPont Co. (USA) )
S. J. McLain ( DuPont Co. (USA) )
O. Nagao ( DuPont K. K. (Japan) )
M. Kaku ( DuPont K. K. (Japan) )
M. Mocella ( DuPont Co. (USA) )
M. K. Yang ( DuPont Co. (USA) )
M. F. Lemon ( DuPont Co. (USA) )
L. Brubaker ( DuPont Co. (USA) )
A. L. Shoe ( DuPont Co. (USA) )
B. Fones ( DuPont Co. (USA) )
B. E. Fischel ( DuPont Co. (USA) )
K. Krohn ( MIT Lincoln Lab (USA) )
D. Hardy ( MIT Lincoln Lab (USA) )
C. Y. Chen ( DuPont-EKC (USA) )
15 more
Publication title:
Optical microlithography XX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6520
Pub. date:
2007
Vol.:
6520
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819466396 [0819466395]
Language:
English
Call no.:
P63600/6520
Type:
Conference Proceedings

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