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Early look into device level imaging with beyond water immersion

Author(s):
W. Conley ( Freescale Semiconductor, Inc. (France) )
S. Warrick ( Freescale Semiconductor, Inc. (France) )
C. Garza ( Freescale Semiconductor, Inc. (USA) )
P. Goirand ( ST Microeletronics (France) )
J. Gemmink ( NXP (France) )
D. V. Steenwinckel ( NXP Research (Belgium) )
1 more
Publication title:
Optical microlithography XX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6520
Pub. Year:
2007
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819466396 [0819466395]
Language:
English
Call no.:
P63600/6520
Type:
Conference Proceedings

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