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Patterning with amorphous carbon spacer for expanding the resolution limit of current lithography tool

Author(s):
W. Jung ( Hynix Semiconductor Inc. (South Korea) )
S. Kim ( Hynix Semiconductor Inc. (South Korea) )
C. Kim ( Hynix Semiconductor Inc. (South Korea) )
G. Sim ( Hynix Semiconductor Inc. (South Korea) )
S. Jeon ( Hynix Semiconductor Inc. (South Korea) )
S. Park ( Hynix Semiconductor Inc. (South Korea) )
B. Lee ( Hynix Semiconductor Inc. (South Korea) )
J. Kim ( Lam Research Corp. (USA) )
L. Heon ( Lam Research Corp. (USA) )
4 more
Publication title:
Optical microlithography XX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6520
Pub. Year:
2007
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819466396 [0819466395]
Language:
English
Call no.:
P63600/6520
Type:
Conference Proceedings

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