The random contact hole solutions for future technology nodes
- Author(s):
A. Chen ( ASML Taiwan Ltd. (Taiwan) ) S. Hansen ( ASML US, Inc. (USA) ) M. Moers ( ASML Netherlands B.V. (Netherlands) ) J. Shieh ( ASML Taiwan Ltd. (Taiwan) ) A. Engelen ( ASML Netherlands B.V. (Netherlands) ) K. van I. Schenau ( ASML Netherlands B.V. (Netherlands) ) S. Tseng ( ASML Taiwan Ltd. (Taiwan) ) - Publication title:
- Optical microlithography XX
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6520
- Pub. Year:
- 2007
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819466396 [0819466395]
- Language:
- English
- Call no.:
- P63600/6520
- Type:
- Conference Proceedings
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