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SEM image contouring for OPC model calibration and verification

Author(s):
C. Tabery ( Advanced Micro Devices, Inc. (USA) )
H. Morokuma ( Hitachi High-Technologies Corp. (Japan) )
R. Matsuoka ( Hitachi High-Technologies Corp. (Japan) )
L. Page ( Hitachi High-Technologies America, Inc. (USA) )
G. E. Bailey ( Mentor Graphics Corp. (USA) )
I. Kusnadi ( Mentor Graphics Corp. (USA) )
T. Do ( Mentor Graphics Corp. (USA) )
2 more
Publication title:
Optical microlithography XX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6520
Pub. Year:
2007
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819466396 [0819466395]
Language:
English
Call no.:
P63600/6520
Type:
Conference Proceedings

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