SEM image contouring for OPC model calibration and verification
- Author(s):
C. Tabery ( Advanced Micro Devices, Inc. (USA) ) H. Morokuma ( Hitachi High-Technologies Corp. (Japan) ) R. Matsuoka ( Hitachi High-Technologies Corp. (Japan) ) L. Page ( Hitachi High-Technologies America, Inc. (USA) ) G. E. Bailey ( Mentor Graphics Corp. (USA) ) I. Kusnadi ( Mentor Graphics Corp. (USA) ) T. Do ( Mentor Graphics Corp. (USA) ) - Publication title:
- Optical microlithography XX
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6520
- Pub. Year:
- 2007
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819466396 [0819466395]
- Language:
- English
- Call no.:
- P63600/6520
- Type:
- Conference Proceedings
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