Extending immersion lithography to the 32-nm node

Extending immersion lithography to the 32-nm node

Author(s):

S. Warrick ( Freescale Semiconductor (France) )

W. Conley ( Freescale Semiconductor (France) )

V. Farys ( ST Microelectronics (France) )

M. Benndorf ( NXP Semiconductors (France) )

J. Gemmink ( NXP Semiconductors (France) )

Y. Trouiller ( ST Microelectronics (France) )

J. Belledent ( NXP Semiconductors (France) )

D. Jovanovic ( Freescale Semiconductor (France) )

P. Gouraud ( ST Microelectronics (France) )

4 more

Publication title:

Optical microlithography XX

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6520

Pub. Year:

2007

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819466396 [0819466395]

Language:

English

Call no.:

P63600/6520

Type:

Conference Proceedings

Details

TDL ID:	ZA00046827
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Optical Microlithography
Conf. info. (Number):	2007 : 20th
Conf. info. (Venue):	San Jose, CA, USA
Conf. info. (Date):	2007.02.27-2007.03.02

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