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Extending immersion lithography to the 32-nm node

Author(s):
S. Warrick ( Freescale Semiconductor (France) )
W. Conley ( Freescale Semiconductor (France) )
V. Farys ( ST Microelectronics (France) )
M. Benndorf ( NXP Semiconductors (France) )
J. Gemmink ( NXP Semiconductors (France) )
Y. Trouiller ( ST Microelectronics (France) )
J. Belledent ( NXP Semiconductors (France) )
D. Jovanovic ( Freescale Semiconductor (France) )
P. Gouraud ( ST Microelectronics (France) )
4 more
Publication title:
Optical microlithography XX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6520
Pub. date:
2007
Vol.:
6520
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819466396 [0819466395]
Language:
English
Call no.:
P63600/6520
Type:
Conference Proceedings

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