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Immersion defect reduction, part II: the formation mechanism and reduction of patterned defects

Author(s):
L. Shiu ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
F. Liang ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
H. Chang ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
C. Chen ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
L. Chen ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
T. Gau ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
B. J. Lin ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
2 more
Publication title:
Optical microlithography XX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6520
Pub. Year:
2007
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819466396 [0819466395]
Language:
English
Call no.:
P63600/6520
Type:
Conference Proceedings

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