Study of iso-dense bias (IDB) sensitivity to laser spectral shape at the 45nm node

Study of iso-dense bias (IDB) sensitivity to laser spectral shape at the 45nm node

Author(s):

K. Yoshimochi ( NEC Electronics Corp. (Japan) )

T. Uchiyama ( NEC Electronics Corp. (Japan) )

T. Tamura ( NEC Electronics Corp. (Japan) )

T. Theeuwes ( ASML Netherlands B.V. (Netherlands) )

R. Peeters ( ASML Netherlands B.V. (Netherlands) )

H. van der Laan ( ASML Netherlands B.V. (Netherlands) )

H. Bakker ( ASML Netherlands B.V. (Netherlands) )

K. Morisaki ( ASML Japan Co., Ltd. (Japan) )

T. Oga ( Cymer Japan, Inc. (Japan) )

4 more

Publication title:

Optical microlithography XX

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6520

Pub. Year:

2007

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819466396 [0819466395]

Language:

English

Call no.:

P63600/6520

Type:

Conference Proceedings

Details

TDL ID:	ZA00046827
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Optical Microlithography
Conf. info. (Number):	2007 : 20th
Conf. info. (Venue):	San Jose, CA, USA
Conf. info. (Date):	2007.02.27-2007.03.02

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