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OPC in memory-device patterns using boundary layer model for 3-dimensional mask topographic effect

Author(s):
Y. Kim ( Samsung Electronics Co., Ltd. (South Korea) )
I. Kim ( Samsung Electronics Co., Ltd. (South Korea) )
J. Park ( Samsung Electronics Co., Ltd. (South Korea) )
S. Kim ( Samsung Electronics Co., Ltd. (South Korea) )
S. Suh ( Samsung Electronics Co., Ltd. (South Korea) )
Y. Cheon ( Samsung Electronics Co., Ltd. (South Korea) )
S. Lee ( Samsung Electronics Co., Ltd. (South Korea) ) , ( Synopsys, Inc. (USA) )
J. Lee ( Samsung Electronics Co., Ltd. (South Korea) )
C. Kang ( Samsung Electronics Co., Ltd. (South Korea) )
J. Moon ( Samsung Electronics Co., Ltd. (South Korea) )
J. Cobb ( Synopsys, Inc. (USA) )
6 more
Publication title:
Optical microlithography XX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6520
Pub. Year:
2007
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819466396 [0819466395]
Language:
English
Call no.:
P63600/6520
Type:
Conference Proceedings

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