OPC in memory-device patterns using boundary layer model for 3-dimensional mask topographic effect
- Author(s):
Y. Kim ( Samsung Electronics Co., Ltd. (South Korea) ) I. Kim ( Samsung Electronics Co., Ltd. (South Korea) ) J. Park ( Samsung Electronics Co., Ltd. (South Korea) ) S. Kim ( Samsung Electronics Co., Ltd. (South Korea) ) S. Suh ( Samsung Electronics Co., Ltd. (South Korea) ) Y. Cheon ( Samsung Electronics Co., Ltd. (South Korea) ) S. Lee ( Samsung Electronics Co., Ltd. (South Korea) ) , ( Synopsys, Inc. (USA) ) J. Lee ( Samsung Electronics Co., Ltd. (South Korea) ) C. Kang ( Samsung Electronics Co., Ltd. (South Korea) ) J. Moon ( Samsung Electronics Co., Ltd. (South Korea) ) J. Cobb ( Synopsys, Inc. (USA) ) - Publication title:
- Optical microlithography XX
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6520
- Pub. Year:
- 2007
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819466396 [0819466395]
- Language:
- English
- Call no.:
- P63600/6520
- Type:
- Conference Proceedings
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