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Fast and accurate 3D mask model for full-chip OPC and verification

Author(s):
P. Liu ( Brion Technologies, Inc. (USA) )
Y. Cao ( Brion Technologies, Inc. (USA) )
L. Chen ( Brion Technologies, Inc. (USA) )
G. Chen ( Brion Technologies, Inc. (USA) )
M. Feng ( Brion Technologies, Inc. (USA) )
J. Jiang ( Brion Technologies, Inc. (USA) )
H. Liu ( Brion Technologies, Inc. (USA) )
S. Suh ( Samsung Electronics, Co. LTD (South Korea) )
S. Lee ( Samsung Electronics, Co. LTD (South Korea) )
4 more
Publication title:
Optical microlithography XX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6520
Pub. Year:
2007
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819466396 [0819466395]
Language:
English
Call no.:
P63600/6520
Type:
Conference Proceedings

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