Patterning control budgets for the 32-nm generation incorporating lithography, design, and RET variations

Patterning control budgets for the 32-nm generation incorporating lithography, design, and RET variations

Author(s):

K. Lucas ( Synopsys, Inc. (USA) )

C. Cork ( Synopsys SARL (France) )

J. Cobb ( Synopsys, Inc. (USA) )

B. Ward ( Synopsys, Inc. (USA) and IMEC (Belgium) )

M. Drapeau ( Synopsys, Inc. (Canada) )

C. Zhang ( Synopsys, Inc. (USA) )

J. Allgair ( International SEMATECH (USA) )

M. Kling ( Synopsys, Inc. (USA) )

M. Rieger ( Synopsys, Inc. (USA) )

4 more

Publication title:

Optical microlithography XX

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6520

Pub. Year:

2007

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819466396 [0819466395]

Language:

English

Call no.:

P63600/6520

Type:

Conference Proceedings

Details

TDL ID:	ZA00046827
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Optical Microlithography
Conf. info. (Number):	2007 : 20th
Conf. info. (Venue):	San Jose, CA, USA
Conf. info. (Date):	2007.02.27-2007.03.02

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