Evaluating the performance of a 193-nm hyper-NA immersion scanner using scatterometry
- Author(s):
O. Kritsun ( Advanced Micro Devices, Inc. (USA) ) B. L. Fontaine ( Advanced Micro Devices, Inc. (USA) ) R. Sandberg ( Advanced Micro Devices, Inc. (USA) ) A. Acheta ( Advanced Micro Devices, Inc. (USA) ) H. J. Levinson ( Advanced Micro Devices, Inc. (USA) ) K. Lensing ( Advanced Micro Devices, Inc. (USA) ) M. Dusa ( ASML MaskTools Inc. (USA) ) J. Hauschild ( ASML MaskTools Inc. (USA) ) A. Pici ( ASML MaskTools Inc. (USA) ) C. Saravanan ( Nanometrics Inc. (USA) ) K. Primak ( Nanometrics Inc. (USA) ) R. Korlahalli ( Nanometrics Inc. (USA) ) S. Nirmalgandhi ( Nanometrics Inc. (USA) ) - Publication title:
- Optical microlithography XX
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6520
- Pub. Year:
- 2007
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819466396 [0819466395]
- Language:
- English
- Call no.:
- P63600/6520
- Type:
- Conference Proceedings
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