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Issues and challenges of double patterning lithography in DRAM

Author(s):
S. Kim ( Hynix Semiconductor Inc. (South Korea) )
S. Koo ( Hynix Semiconductor Inc. (South Korea) )
J. Choi ( Hynix Semiconductor Inc. (South Korea) )
Y. Hwang ( Hynix Semiconductor Inc. (South Korea) )
J. Park ( Hynix Semiconductor Inc. (South Korea) )
E. Kang ( Hynix Semiconductor Inc. (South Korea) )
C. Lim ( Hynix Semiconductor Inc. (South Korea) )
S. Moon ( Hynix Semiconductor Inc. (South Korea) )
J. Kim ( Hynix Semiconductor Inc. (South Korea) )
4 more
Publication title:
Optical microlithography XX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6520
Pub. date:
2007
Vol.:
6520
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819466396 [0819466395]
Language:
English
Call no.:
P63600/6520
Type:
Conference Proceedings

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