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Pitch doubling through dual-patterning lithography challenges in integration and litho budgets

Author(s):
M. Dusa ( ASML US Inc. (USA) )
J. Quaedackers ( ASML Netherlands B.V. (Netherlands) )
O. F. A. Larsen ( ASML Netherlands B.V. (Netherlands) )
J. Meessen ( ASML Netherlands B.V. (Netherlands) )
E. van der Heijden ( ASML Netherlands B.V. (Netherlands) )
G. Dicker ( ASML Netherlands B.V. (Netherlands) )
O. Wismans ( ASML Netherlands B.V. (Netherlands) )
P. de Haas ( ASML Netherlands B.V. (Netherlands) )
K. van I. Schenau ( ASML Netherlands B.V. (Netherlands) )
J. Finders ( ASML Netherlands B.V. (Netherlands) )
B. Vleeming ( ASML Netherlands B.V. (Netherlands) )
G. Storms ( IMEC (Belgium) )
P. Jaenen ( IMEC (Belgium) )
S. Cheng ( IMEC (Belgium) )
M. Maenhoudt ( IMEC (Belgium) )
10 more
Publication title:
Optical microlithography XX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6520
Pub. Year:
2007
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819466396 [0819466395]
Language:
English
Call no.:
P63600/6520
Type:
Conference Proceedings

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