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Benefit of ArF immersion lithography in 55 nm logic device manufacturing

Author(s):
T. Uchiyama ( NEC Electronics Corp. (Japan) )
T. Tamura ( NEC Electronics Corp. (Japan) )
K. Yoshimochi ( NEC Electronics Corp. (Japan) )
P. Graupner ( Carl Zeiss, Semiconductor Manufacturing Technology AG (Germany) )
H. Bakker ( ASML (Netherlands) )
E. van Setten ( ASML (Netherlands) )
K. Morisaki ( ASML Japan (Japan) )
2 more
Publication title:
Optical microlithography XX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6520
Pub. Year:
2007
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819466396 [0819466395]
Language:
English
Call no.:
P63600/6520
Type:
Conference Proceedings

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