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Performance of immersion lithography for 45-nm-node CMOS and ultra-high density SRAM with 0.25um2

Author(s):
S. Mimotogi ( Toshiba Corp. (Japan) )
F. Uesawa ( Sony Corp. (Japan) )
M. Tominaga ( NEC Electronics Corp. (Japan) )
H. Fujise ( Toshiba Corp. (Japan) )
K. Sho ( Toshiba Corp. (Japan) )
M. Katsumata ( Sony Corp. (Japan) )
H. Hane ( Sony Corp. (Japan) )
A. Ikegami ( Sony Corp. (Japan) )
S. Nagahara ( NEC Electronics (Japan) )
T. Ema ( Toshiba Corp. (Japan) )
M. Asano ( Toshiba Corp. (Japan) )
H. Kanai ( Toshiba Corp. (Japan) )
T. Kimura ( Toshiba Corp. (Japan) )
M. Iwai ( Toshiba Corp. (Japan) )
9 more
Publication title:
Optical microlithography XX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6520
Pub. date:
2007
Vol.:
6520
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819466396 [0819466395]
Language:
English
Call no.:
P63600/6520
Type:
Conference Proceedings

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