
Performance of immersion lithography for 45-nm-node CMOS and ultra-high density SRAM with 0.25um2
- Author(s):
S. Mimotogi ( Toshiba Corp. (Japan) ) F. Uesawa ( Sony Corp. (Japan) ) M. Tominaga ( NEC Electronics Corp. (Japan) ) H. Fujise ( Toshiba Corp. (Japan) ) K. Sho ( Toshiba Corp. (Japan) ) M. Katsumata ( Sony Corp. (Japan) ) H. Hane ( Sony Corp. (Japan) ) A. Ikegami ( Sony Corp. (Japan) ) S. Nagahara ( NEC Electronics (Japan) ) T. Ema ( Toshiba Corp. (Japan) ) M. Asano ( Toshiba Corp. (Japan) ) H. Kanai ( Toshiba Corp. (Japan) ) T. Kimura ( Toshiba Corp. (Japan) ) M. Iwai ( Toshiba Corp. (Japan) ) - Publication title:
- Optical microlithography XX
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6520
- Pub. date:
- 2007
- Vol.:
- 6520
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819466396 [0819466395]
- Language:
- English
- Call no.:
- P63600/6520
- Type:
- Conference Proceedings
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