Blank Cover Image

Integrating immersion lithography in 45-nm logic manufacturing

Author(s):
M. Benndorf ( NXP Semiconductors (France) )
S. Warrick ( Freescale Semiconductor, Inc. (France) )
W. Conley ( Freescale Semiconductor, Inc. (France) )
D. Cruau ( Freescale Semiconductor, Inc. (France) )
D. DeSimone ( ST Microelectronics (France) )
K. Mestadi ( ST Microelectronics (France) )
V. Farys ( ST Microelectronics (France) )
J. Gemmink ( NXP Semiconductors (France) )
3 more
Publication title:
Optical microlithography XX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6520
Pub. Year:
2007
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819466396 [0819466395]
Language:
English
Call no.:
P63600/6520
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Extending immersion lithography to the 32-nm node

S. Warrick, W. Conley, V. Farys, M. Benndorf, J. Gemmink, Y. Trouiller, J. Belledent, D. Jovanovic, P. Gouraud

SPIE - The International Society of Optical Engineering
7 Conference Proceedings Resist component leaching in 193-nm immersion lithography

Chapon, J.-D., Chaton, C., Gouraud, P., Broekaart, M., Warrick, S., Guilmeau, I., Trauiller, Y., Belledent, J.

SPIE - The International Society of Optical Engineering
2 Conference Proceedings Investigation on immersion defectivity root cause

V. Farys, S. Gaugiran, D. Cruau, K. Mestadi, S. Warrick, M. Benndorf, R. Feilleux, C. Sourd

SPIE - The International Society of Optical Engineering
8 Conference Proceedings Implications of immersion lithography on 193-nm photoresists

Taylor, J.C., Chambers, C.R., Deschner, R., LeSuer, R.J., Conley, W.E., Burns, S.D., Willson, C.G.

SPIE - The International Society of Optical Engineering
3 Conference Proceedings Immersion lithography robustness for the C065 node [6154-07]

Warrick, S., Morton, R., Mauri, A., Chapon, J. D, Belledent, J., Conley, W., Barr, A., Lucas, K., Monget, C., Plantier, …

SPIE - The International Society of Optical Engineering
9 Conference Proceedings Deep-UV immersion interferometric lithography

Raub, A.K., Frauenglass, A., Brueck, S.R.J., Conley, W., Dammel, R.R., Romano, A., Sato, M., Hinsberg, W.

SPIE - The International Society of Optical Engineering
4 Conference Proceedings Optical issues of thin organic pellicles in 45-nm and 32-nm immersion lithography [6349-20]

Lucas, K., Gordon, J. S., Conley, W., Saied, M., Warrick, S., Pochkowski, M., Smith, M. D., West, C., Kalk, F., Kuijten, …

SPIE - The International Society of Optical Engineering
10 Conference Proceedings Assessment of complementary double dipole lithography for 45 nm and 32 nm technologies

Postnikov, S. V., Robert, E., Thony, P., Patterson, K., Warrick, S., Henry, D., Torres, A., Toublon, O.

SPIE - The International Society of Optical Engineering
5 Conference Proceedings Early look into device level imaging with beyond water immersion

W. Conley, S. Warrick, C. Garza, P. Goirand, J. Gemmink, D. V. Steenwinckel

SPIE - The International Society of Optical Engineering
11 Conference Proceedings 32 nm logic patterning options with immersion lithography

K. Lai, S. Burns, S. Halle, L. Zhuang, M. Colburn

Society of Photo-optical Instrumentation Engineers
6 Conference Proceedings 32-nm SOC printing with double patterning, regular design, and 1.2 NA immersion scanner

Y. Trouiller, V. Farys, A. Borjon, J. Belledent, C. Couderc, F. Sundermann, J. Urbani, Y. Rody, C. Gardin, J. Planchot, …

SPIE - The International Society of Optical Engineering
12 Conference Proceedings 45nm design rule in-die overlay metrology on immersion lithography processes

Y. Shih, G. K. Huang, C. Yu, M. Adel, C. K. Huang, P. Izikson, E. Kassel, S. Mathur, C. Huang, D. Tien, Y. Avrahamov

SPIE - The International Society of Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12