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The rational design of polymeric EUV resist materials by QSPR modelling

Author(s):
K. Jack ( The Univ. of Queensland (Australia) )
H. Liu ( The Univ. of Queensland (Australia) )
I. Blakey ( The Univ. of Queensland (Australia) )
D. Hill ( The Univ. of Queensland (Australia) )
W. Yueh ( Intel Corp. (USA) )
H. Cao ( Intel Corp. (USA) )
M. Leeson ( Intel Corp. (USA) )
G. Denbeaux ( Univ. at Albany (USA) )
J. Waterman ( Univ. at Albany (USA) )
A. Whittaker ( The Univ. of Queensland (Australia) )
5 more
Publication title:
Advances in resist materials and processing technology XXIV
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6519
Pub. Year:
2007
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819466389 [0819466387]
Language:
English
Call no.:
P63600/6519
Type:
Conference Proceedings

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