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32-nm pattern collapse modeling with radial distance and rinse speed

Author(s):
J. Kim ( Hanyang Univ. (South Korea) )
W. Chang ( Hanyang Univ. (South Korea) )
S. Park ( Hanyang Univ. (South Korea) )
H. Oh ( Hanyang Univ. (South Korea) )
S. Lee ( Samsung Electronics Co., Ltd. (South Korea) )
S. Kim ( Samsung Electronics Co., Ltd. (South Korea) )
1 more
Publication title:
Advances in resist materials and processing technology XXIV
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6519
Pub. Year:
2007
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819466389 [0819466387]
Language:
English
Call no.:
P63600/6519
Type:
Conference Proceedings

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