Molecular contamination control technologies for high-volume production phase in high-NA 193nm lithography

Author(s):

T. Nakano ( Nichias Corp. (Japan) )

T. Tanahashi ( Nichias Corp. (Japan) )

A. Imai ( Nichias Corp. (Japan) )

K. Yamana ( Nichias Corp. (Japan) )

T. Shimotsu ( Nichias Corp. (Japan) )

N. Takahashi ( Tokyo Electron AT Ltd. (Japan) )

M. Shioguchi ( Tokyo Electron Kyushu Ltd. (Japan) )

Y. Matsuda ( Tokyo Electron Kyushu Ltd. (Japan) )

J. Kitano ( Tokyo Electron Kyushu Ltd. (Japan) )

4 more

Publication title:

Advances in resist materials and processing technology XXIV

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6519

Pub. Year:

2007

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819466389 [0819466387]

Language:

English

Call no.:

P63600/6519

Type:

Conference Proceedings