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Spin-on organic hardmask materials in 70nm devices

Author(s):
C. Oh ( Cheil Industries, Inc. (South Korea) )
D. Uh ( Cheil Industries, Inc. (South Korea) )
D. Kim ( Cheil Industries, Inc. (South Korea) )
J. Lee ( Cheil Industries, Inc. (South Korea) )
H. Yun ( Cheil Industries, Inc. (South Korea) )
I. Nam ( Cheil Industries, Inc. (South Korea) )
M. Kim ( Cheil Industries, Inc. (South Korea) )
K. Yoon ( Cheil Industries, Inc. (South Korea) )
K. Hyung ( Cheil Industries, Inc. (South Korea) )
N. Tokareva ( Cheil Industries, Inc. (South Korea) )
H. Cheon ( Cheil Industries, Inc. (South Korea) )
J. Kim ( Cheil Industries, Inc. (South Korea) )
T. Chang ( Cheil Industries, Inc. (South Korea) )
8 more
Publication title:
Advances in resist materials and processing technology XXIV
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6519
Pub. Year:
2007
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819466389 [0819466387]
Language:
English
Call no.:
P63600/6519
Type:
Conference Proceedings

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