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Formulated surface conditioners in 50 nm immersion lithography: simultaneously reducing pattern collapse and line-width roughness

Author(s):
M. Sugiyama ( Sokudo, Co., Ltd. (Japan) )
M. Sanada ( Sokudo, Co., Ltd. (Japan) )
S. Wang ( ASML Netherlands B.V. (Netherlands) )
P. Wong ( ASML Netherlands B.V. (Netherlands) )
S. Sinkwitz ( ASML Netherlands B.V. (Netherlands) )
M. Jaramillo, Jr. ( Air Products and Chemicals, Inc. (USA) )
G. Parris ( Air Products and Chemicals, Inc. (USA) )
2 more
Publication title:
Advances in resist materials and processing technology XXIV
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6519
Pub. Year:
2007
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819466389 [0819466387]
Language:
English
Call no.:
P63600/6519
Type:
Conference Proceedings

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