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Process optimization for developer soluble immersion topcoat material

Author(s):
H. Nakagawa ( JSR Corp. (Japan) )
K. Goto ( JSR Corp. (Japan) )
M. Shima ( JSR Corp. (Japan) )
J. Takahashi ( JSR Corp. (Japan) )
T. Shimokawa ( JSR Corp. (Japan) )
K. Ichino ( Tokyo Electron Kyushu Ltd. (Japan) )
N. Nagatani ( Tokyo Electron Kyushu Ltd. (Japan) )
H. Kyoda ( Tokyo Electron Kyushu Ltd. (Japan) )
K. Yoshihara ( Tokyo Electron Kyushu Ltd. (Japan) )
4 more
Publication title:
Advances in resist materials and processing technology XXIV
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6519
Pub. Year:
2007
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819466389 [0819466387]
Language:
English
Call no.:
P63600/6519
Type:
Conference Proceedings

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