Transfer mechanism of defects on topcoat to resist pattern in immersion lithography process and effects on etching process

Author(s):

• N. Takahashi ( Tokyo Electron Kyushu Ltd. (Japan) )
• S. Shimura ( Tokyo Electron Kyushu Ltd. (Japan) )
• T. Kawasaki ( Tokyo Electron Kyushu Ltd. (Japan) )

Publication title:

Advances in resist materials and processing technology XXIV

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6519

Pub. Year:

2007

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819466389 [0819466387]

Language:

English

Call no.:

P63600/6519

Type:

Conference Proceedings