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Modified polymer architecture for immersion lithography

Author(s):
S. S. Kim ( Dongjin Semichem Co. Ltd. (South Korea) )
J. W. Kim ( Dongjin Semichem Co. Ltd. (South Korea) )
J. Y. Lee ( Dongjin Semichem Co. Ltd. (South Korea) )
S. K. Oh ( Dongjin Semichem Co. Ltd. (South Korea) )
S. H. Lee ( Dongjin Semichem Co. Ltd. (South Korea) )
J. W. Lee ( Dongjin Semichem Co. Ltd. (South Korea) )
D. bae Kim ( Dongjin Semichem Co. Ltd. (South Korea) )
J. Kim ( Dongjin Semichem Co. Ltd. (South Korea) )
K. D. Ban ( Hynix Semiconductor Inc. (South Korea) )
C. K. Bok ( Hynix Semiconductor Inc. (South Korea) )
S. Moon ( Hynix Semiconductor Inc. (South Korea) )
6 more
Publication title:
Advances in resist materials and processing technology XXIV
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6519
Pub. Year:
2007
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819466389 [0819466387]
Language:
English
Call no.:
P63600/6519
Type:
Conference Proceedings

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