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Study on the reduction of defects in immersion lithography

Author(s):
K. Ban ( Hynix Semiconductor Inc. (South Korea) )
S. Park ( Hynix Semiconductor Inc. (South Korea) )
C. Bok ( Hynix Semiconductor Inc. (South Korea) )
H. Lim ( Hynix Semiconductor Inc. (South Korea) )
J. Heo ( Hynix Semiconductor Inc. (South Korea) )
H. Chun ( Hynix Semiconductor Inc. (South Korea) )
J. Kang ( Hynix Semiconductor Inc. (South Korea) )
S. Moon ( Hynix Semiconductor Inc. (South Korea) )
3 more
Publication title:
Advances in resist materials and processing technology XXIV
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6519
Pub. Year:
2007
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819466389 [0819466387]
Language:
English
Call no.:
P63600/6519
Type:
Conference Proceedings

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