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Self-aligned self-assembled organosilicate line patterns of ~20nm half-pitch from block-copolymer mediated self assembly

Author(s):
H. Kim ( IBM (USA) )
J. Cheng ( IBM (USA) )
C. Rettner ( IBM (USA) )
O. Park ( IBM (USA) )
R. Miller ( IBM (USA) )
M. Hart ( IBM (USA) )
L. Sundstrom ( IBM (USA) )
Y. Zhang ( IBM (USA) )
3 more
Publication title:
Advances in resist materials and processing technology XXIV
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6519
Pub. date:
2007
Vol.:
6519
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819466389 [0819466387]
Language:
English
Call no.:
P63600/6519
Type:
Conference Proceedings

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