Silicon-based anti-reflective spin-on hardmask materials with improved storage stability for 193-nm lithography
- Author(s):
S. K. Kim ( Samsung Cheil Industries, Inc. (South Korea) ) S. H. Lim ( Samsung Cheil Industries, Inc. (South Korea) ) D. Kim ( Samsung Cheil Industries, Inc. (South Korea) ) S. R. Koh ( Samsung Cheil Industries, Inc. (South Korea) ) M. Kim ( Samsung Cheil Industries, Inc. (South Korea) ) H. C. Yoon ( Samsung Cheil Industries, Inc. (South Korea) ) D. S. Uh ( Samsung Cheil Industries, Inc. (South Korea) ) J. S. Kim ( Samsung Cheil Industries, Inc. (South Korea) ) T. Chang ( Samsung Cheil Industries, Inc. (South Korea) ) - Publication title:
- Advances in resist materials and processing technology XXIV
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6519
- Pub. Year:
- 2007
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819466389 [0819466387]
- Language:
- English
- Call no.:
- P63600/6519
- Type:
- Conference Proceedings
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