Spin-on tri-layer approaches to high NA 193-nm lithography

Spin-on tri-layer approaches to high NA 193-nm lithography

Author(s):

D. J. Abdallah ( AZ Electronic Materials USA Corp. (USA) )

D. McKenzie ( AZ Electronic Materials USA Corp. (USA) )

A. Timko ( AZ Electronic Materials USA Corp. (USA) )

A. Dioses ( AZ Electronic Materials USA Corp. (USA) )

F. Houlihan ( AZ Electronic Materials USA Corp. (USA) )

D. Rahman ( AZ Electronic Materials USA Corp. (USA) )

S. Miyazaki ( AZ Electronic Materials USA Corp. (USA) )

R. Zhang ( AZ Electronic Materials USA Corp. (USA) )

W. Kim ( AZ Electronic Materials USA Corp. (USA) )

H. Wu ( AZ Electronic Materials USA Corp. (USA) )

L. Pylneva ( AZ Electronic Materials USA Corp. (USA) )

P. Lu ( AZ Electronic Materials USA Corp. (USA) )

M. Neisser ( AZ Electronic Materials USA Corp. (USA) )

R. R. Dammel ( AZ Electronic Materials USA Corp. (USA) )

J. J. Biafore ( KLA Tencor (USA) )

10 more

Publication title:

Advances in resist materials and processing technology XXIV

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6519

Pub. Year:

2007

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819466389 [0819466387]

Language:

English

Call no.:

P63600/6519

Type:

Conference Proceedings

Details

TDL ID:	ZA00046826
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Advances in Resist Materials and Processing Technology
Conf. info. (Number):	2007 : 24th
Conf. info. (Venue):	San Jose, CA, USA
Conf. info. (Date):	2007.02.26-2007.02.28

Similar Items:

1 Conference Proceedings Versatility in lithographic performance of advanced 193 nm contact hole resist [6153-86] Kudo, T., Lin, G., Lee, D., Rahman, D., Timko, A., Mckenzie, D., Anyadiegwu, C., Chiu, S., Houlihan, F., Rentkiewicz, … SPIE - The International Society of Optical Engineering	7 Conference Proceedings 193-nm single-layer photoresists based on alternating copolymers of cycloolefins: the use of photogenerators of sulfamic acids Houlihan,F.M., Kometani,J.M., Timko,A.G., Hutton,R.S., Cirelli,R.A., Reichmanis,E., Nalamasu,O., Gabor,A., Medina,A., … SPIE-The International Society for Optical Engineering
2 Conference Proceedings Second-generation radiation sensitive developable bottom anti-reflective coatings (DBARC) and implant resists approaches for 193-nm lithography F. Houlihan, A. Dioses, M. Toukhy, A. Romano, J. Oberlander, H. Wu, S. Mullen, A. Krawicz, P. Lu, M. Neisser SPIE - The International Society of Optical Engineering	8 Conference Proceedings New polymers for 193-nm single-layer resists based on substituted cycloolefins/maleic anhydride resins Rushkin, I. L., Houlihan, F. M., Kometani, J. M., Hutton, R. S., Timko, A. G., Reichmanis, E., Nalamasu, O., Gabor, A. … SPIE - The International Society of Optical Engineering
3 Conference Proceedings Spin-on trilayer scheme: enabling materials for extension of ArF immersion lithography to 32nm node and beyond R. Zhang, A. G. Timko, L. Pylneva, J. Loch, H. Wu Society of Photo-optical Instrumentation Engineers	9 Conference Proceedings Optimization of 193-nm single-layer resists through statistical design Cabor, A. H., Dimov, O., Medina, A. N., Neisser, M. O., Slater, S. G., Wang, R. H., Houlihan, F. M., Cirelli, R. A., … SPIE - The International Society of Optical Engineering
4 Conference Proceedings 193 nm resist composition using hybrid copolymers of cycloolefin/maleic anhydride (COMA)/methacrylate [6153-14] Rahman, M D, Chakrapani, S, Anyadiegwu, C, Lin, G, Timko, A, Houlihan, F, Rentkiewicz, D, Kudo, T, McKenzie, D, Dammel, … SPIE - The International Society of Optical Engineering	10 Conference Proceedings Novel hybrid copolymers of cycloolefin/maleic anhydride (COMA)/methacrylate for 193-nm resist compositions Rahman,M.D., McKenzie,D.S., Bae,J.-B., Kudo,T., Kim,W.-K., Padmanaban,M., Dammel,R.R. SPIE-The International Society for Optical Engineering
5 Conference Proceedings Etching spin-on trilayer masks D. J. Abdallah, S. Miyazaki, A. Hishida, A. Timko, D. McKenzie Society of Photo-optical Instrumentation Engineers	11 Conference Proceedings Second-generation radiation sensitive 193-nm developable bottom antireflective coatings (DBARC): recent results F. Houlihan, A. Dioses, L. Zhang, J. Oberlander, A. Krawicz Society of Photo-optical Instrumentation Engineers
6 Conference Proceedings CD changes of 193-nm resists during SEM measurement Kudo,T., Bae,J.-B., Dammel,R.R., Kim,W.-K., McKenzie,D.S., Rahman,M.D., Padmanaban,M., Ng,W. SPIE-The International Society for Optical Engineering	12 Conference Proceedings Performance of imide and methide onium PAGs in 193-nm resist formulations Padmanaban, M., Dammel, R.R., Lee, S.H., Kim, W.-K., Kudo, T., McKenzie, D.S., Rahman, D. SPIE-The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12