Blank Cover Image

Novel high-index resists for 193-nm immersion lithography and beyond

Author(s):
I. Blakey ( The Univ. of Queensland (Australia) )
L. Chen ( The Univ. of Queensland (Australia) )
B. Dargaville ( The Univ. of Queensland (Australia) )
H. Liu ( The Univ. of Queensland (Australia) )
A. Whittaker ( The Univ. of Queensland (Australia) )
W. Conley ( Freescale Semiconductor, Inc. (USA) )
E. Piscani ( Sematech, Inc. (USA) )
G. Rich ( Sematech, Inc. (USA) )
A. Williams ( Sematech, Inc. (USA) )
P. Zimmerman ( Sematech, Inc. (USA) )
5 more
Publication title:
Advances in resist materials and processing technology XXIV
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6519
Pub. Year:
2007
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819466389 [0819466387]
Language:
English
Call no.:
P63600/6519
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Synthesis of high rrefractive index sulfur containing polymers for 193nm immersion lithography: a progress report [6153-69]

Blakey, I, Conley, W, George, G A, Hill, D J, Liu, H, Whittaker, A K

SPIE - The International Society of Optical Engineering
7 Conference Proceedings Continuing 193nm optical lithography for 32nm imaging and beyond

E. C. Piscani, D. Ashworth, J. Byers, C. Van Peski, P. Zimmerman

Society of Photo-optical Instrumentation Engineers
2 Conference Proceedings High-RI resist polymers for 193 nm immersion lithography

Andrew K. Whittaker, Idriss Blakey, Heping Liu, David J.T. Hill, Graeme A. George, Will Conley, Paul Zimmerman

SPIE - The International Society of Optical Engineering
8 Conference Proceedings Imaging and photochemistry studies of fluoropolymers for 193-nm lithography

Conley, W., Zimmerman, P., Miller, D., Lee, G.S.

SPIE-The International Society for Optical Engineering
3 Conference Proceedings Development of an operational high refractive index resist for 193nm immersion lithography

P. A. Zimmerman, J. Byers, E. Piscani, B. Rice, C. K. Ober

Society of Photo-optical Instrumentation Engineers
9 Conference Proceedings Fluoropolymer resists for 157 nm lithography

Vohra, V.R., Liu, X.-Q., Douki, K., Ober, C.K., Conley, W., Zimmerman, P., Miller, D.

SPIE-The International Society for Optical Engineering
4 Conference Proceedings Novel chemical shrinkage material for small contact hole and small space patterning

Whittaker, A. K., Blakey, I., Liu, H., Hill, D. J. T., George, G. A., Conley, W., Zimmerman, P.

SPIE - The International Society of Optical Engineering
10 Conference Proceedings High-index optical materials for 193-nm immersion Iithogrqphy [6154-45]

Burnett, J. H., Kaplan, S. G., Shirley, E. L., Horowitz, D., Clauss, W., Grenville, A., Van Peski, C.

SPIE - The International Society of Optical Engineering
5 Conference Proceedings High-index resist for 193-nm immersion lithography

K. Matsumoto, E. Costner, I. Nishimura, M. Ueda, C. G. Willson

Society of Photo-optical Instrumentation Engineers
11 Conference Proceedings Implications of immersion lithography on 193-nm photoresists

Taylor, J.C., Chambers, C.R., Deschner, R., LeSuer, R.J., Conley, W.E., Burns, S.D., Willson, C.G.

SPIE - The International Society of Optical Engineering
6 Conference Proceedings High-index materials for 193 nm immersion lithography

John H. Burnett, Simon G. Kaplan, Eric L. Shirley, Paul J. Tompkins, James E. Webb

SPIE - The International Society of Optical Engineering
12 Conference Proceedings The limitations of high-index resists for 193-nm hyper-NA lithography

G. Mcintyre, D. Sanders, R. Sooriyakumaran, H. Truong, R. Allen

Society of Photo-optical Instrumentation Engineers
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12