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The optimization of photoresist profile for sub-90nm technology

Author(s):
  • H. Jeon ( Dongbu Electronics (South Korea) )
  • C. Shim ( Dongbu Electronics (South Korea) )
  • J. Hong ( Dongbu Electronics (South Korea) )
  • J. Han ( Dongbu Electronics (South Korea) )
  • K. Kim ( Dongbu Electronics (South Korea) )
Publication title:
Metrology, inspection, and process control for microlithography XXI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6518
Pub. Year:
2007
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819466372 [0819466379]
Language:
English
Call no.:
P63600/6518
Type:
Conference Proceedings

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