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OCD metrology by floating n/k

Author(s):
S. Yu ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
J. Huang ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
C. Ke ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
T. Gau ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
B. J. Lin ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
A. Yen ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
L. Lane ( Timbre Technologies, Inc. (USA) )
V. Vuong ( Timbre Technologies, Inc. (USA) )
Y. Chen ( Timbre Technologies, Inc. (USA) )
4 more
Publication title:
Metrology, inspection, and process control for microlithography XXI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6518
Pub. Year:
2007
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819466372 [0819466379]
Language:
English
Call no.:
P63600/6518
Type:
Conference Proceedings

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