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Improvement of front-end process overlay in 60nm DRAM

Author(s):
Y. Hwang ( Hynix Semiconductor Industries Co., Ltd. (South Korea) )
W. Ma ( Hynix Semiconductor Industries Co., Ltd. (South Korea) )
E. Kang ( Hynix Semiconductor Industries Co., Ltd. (South Korea) )
C. Lim ( Hynix Semiconductor Industries Co., Ltd. (South Korea) )
S. Moon ( Hynix Semiconductor Industries Co., Ltd. (South Korea) )
S. An ( ASML (South Korea) )
K. Rhe ( ASML (South Korea) )
2 more
Publication title:
Metrology, inspection, and process control for microlithography XXI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6518
Pub. Year:
2007
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819466372 [0819466379]
Language:
English
Call no.:
P63600/6518
Type:
Conference Proceedings

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