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Advanced process control for hyper-NA lithography based on CD-SEM measurement

Author(s):
T. Ishimoto ( Hitachi High-Technologies Corp. (Japan) and IMEC (Belgium) )
K. Sekiguchi ( Hitachi High Technologies Europe GmbH (Germany) and IMEC (Belgium) )
N. Hasegawa ( Hitachi High-Technologies Corp. (Japan) )
T. Maeda ( Hitachi High-Technologies Corp. (Japan) )
K. Watanabe ( Hitachi High-Technologies Corp. (Japan) )
G. Storms ( IMEC (Belgium) )
D. Laidler ( IMEC (Belgium) )
S. Cheng ( IMEC (Belgium) )
3 more
Publication title:
Metrology, inspection, and process control for microlithography XXI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6518
Pub. Year:
2007
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819466372 [0819466379]
Language:
English
Call no.:
P63600/6518
Type:
Conference Proceedings

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