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SEM metrology for advanced lithographies

Author(s):
B. Bunday ( International SEMATECH Manufacturing Initiative (USA) )
J. Allgair ( International SEMATECH Manufacturing Initiative (USA) )
B. J. Rice ( SEMATECH (USA) )
J. Byers ( SEMATECH (USA) )
Y. Avitan ( Applied Materials (Israel) )
R. Peltinov ( Applied Materials (Israel) )
M. Bar-zvi ( Applied Materials (Israel) )
O. Adan ( Applied Materials (Israel) )
J. Swyers ( Applied Materials (USA) )
R. Z. Shneck ( Ben Gurion Univ. of the Negev (Israel) )
5 more
Publication title:
Metrology, inspection, and process control for microlithography XXI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6518
Pub. Year:
2007
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819466372 [0819466379]
Language:
English
Call no.:
P63600/6518
Type:
Conference Proceedings

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