
Advances in process overlay: alignment solutions for future technology nodes
- Author(s):
H. Megens ( ASML (Netherlands) ) R. van Haren ( ASML (Netherlands) ) S. Musa ( ASML (Netherlands) ) M. Doytcheva ( ASML (Netherlands) ) S. Lalbahadoersing ( ASML (Netherlands) ) M. van Kemenade ( ASML (Netherlands) ) H. Lee ( ASML (Netherlands) ) P. Hinnen ( ASML (Netherlands) ) F. van Bilsen ( ASML (Netherlands) ) - Publication title:
- Metrology, inspection, and process control for microlithography XXI
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6518
- Pub. date:
- 2007
- Vol.:
- 6518
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819466372 [0819466379]
- Language:
- English
- Call no.:
- P63600/6518
- Type:
- Conference Proceedings
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