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Study of rigorous effects and polarization on phase shifting masks through simulations and in-die phase measurements

Author(s):
K. M. Lee ( Intel Mask Operation (USA) )
M. Tavassoli ( Intel Mask Operation (USA) )
M. Lau ( Intel Mask Operation (USA) )
K. Baik ( Intel Mask Operation (USA) )
B. Lieberman ( Intel Mask Operation (USA) )
S. Perlitz ( Carl Zeiss SMS GmbH (Germany) )
U. Buttgereit ( Carl Zeiss SMS GmbH (Germany) )
T. Scherubl ( Carl Zeiss SMS GmbH (Germany) )
3 more
Publication title:
Metrology, inspection, and process control for microlithography XXI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6518
Pub. Year:
2007
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819466372 [0819466379]
Language:
English
Call no.:
P63600/6518
Type:
Conference Proceedings

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