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Scatterometry on pelliclized masks: an option for wafer fabs

Author(s):
E. Gallagher ( IBM Corp. (USA) )
C. Benson ( IBM Corp. (USA) )
M. Higuchi ( Toppan Electronics Inc. (USA) )
Y. Okumoto ( Toppan Electronics Inc. (USA) )
M. Kwon ( Timbre Technologies, Inc. (USA) )
S. Yedur ( Timbre Technologies, Inc. (USA) )
S. Li ( Timbre Technologies, Inc. (USA) )
S. Lee ( Nanometrics, Inc. (USA) )
M. Tabet ( Nanometrics, Inc. (USA) )
4 more
Publication title:
Metrology, inspection, and process control for microlithography XXI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6518
Pub. date:
2007
Vol.:
6518
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819466372 [0819466379]
Language:
English
Call no.:
P63600/6518
Type:
Conference Proceedings

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