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The coming of age of tilt CD-SEM

Author(s):
B. Bunday ( International SEMATECH Manufacturing Initiative (USA) )
J. Allgair ( International SEMATECH Manufacturing Initiative (USA) )
E. Solecky ( IBM Microelectronics (USA) )
C. Archie ( IBM Microelectronics (USA) )
N. G. Orji ( National Institute of Standards and Technology (USA) )
J. Beach ( Advanced Technology Development Facility (USA) )
O. Adan ( Applied Materials (Israel) )
R. Peltinov ( Applied Materials (Israel) )
M. Bar-zvi ( Applied Materials (Israel) )
J. Swyers ( Applied Materials (USA) )
5 more
Publication title:
Metrology, inspection, and process control for microlithography XXI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6518
Pub. Year:
2007
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819466372 [0819466379]
Language:
English
Call no.:
P63600/6518
Type:
Conference Proceedings

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