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Realizing value-added metrology

Author(s):
B. Bunday ( International SEMATECH Manufacturing Initiative (USA) )
P. Lipscomb ( International SEMATECH Manufacturing Initiative (USA) )
J. Allgair ( International SEMATECH Manufacturing Initiative (USA) )
D. Patel ( International SEMATECH Manufacturing Initiative (USA) )
M. Caldwell ( Freescale (USA) )
E. Solecky ( IBM Microelectronics (USA) )
C. Archie ( IBM Microelectronics (USA) )
J. Morningstar ( IBM Microelectronics (USA) )
B. J. Rice ( SEMATECH (USA) )
B. Singh ( Advanced Micro Devices (USA) )
J. Cain ( Advanced Micro Devices (USA) )
I. Emami ( Advanced Micro Devices (USA) )
B. Banke, Jr. ( IBM Microelectronics (USA) )
A. Herrera ( Spansion (USA) )
V. Ukraintsev ( Texas Instruments (USA) )
J. Schlessinger ( Texas Instruments (USA) )
J. Ritchison ( Texas Instruments (USA) )
12 more
Publication title:
Metrology, inspection, and process control for microlithography XXI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6518
Pub. date:
2007
Vol.:
6518
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819466372 [0819466379]
Language:
English
Call no.:
P63600/6518
Type:
Conference Proceedings

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