Realizing value-added metrology

Realizing value-added metrology

Author(s):

B. Bunday ( International SEMATECH Manufacturing Initiative (USA) )

P. Lipscomb ( International SEMATECH Manufacturing Initiative (USA) )

J. Allgair ( International SEMATECH Manufacturing Initiative (USA) )

D. Patel ( International SEMATECH Manufacturing Initiative (USA) )

M. Caldwell ( Freescale (USA) )

E. Solecky ( IBM Microelectronics (USA) )

C. Archie ( IBM Microelectronics (USA) )

J. Morningstar ( IBM Microelectronics (USA) )

B. J. Rice ( SEMATECH (USA) )

B. Singh ( Advanced Micro Devices (USA) )

J. Cain ( Advanced Micro Devices (USA) )

I. Emami ( Advanced Micro Devices (USA) )

B. Banke, Jr. ( IBM Microelectronics (USA) )

A. Herrera ( Spansion (USA) )

V. Ukraintsev ( Texas Instruments (USA) )

J. Schlessinger ( Texas Instruments (USA) )

J. Ritchison ( Texas Instruments (USA) )

12 more

Publication title:

Metrology, inspection, and process control for microlithography XXI

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6518

Pub. date:

2007

Vol.:

6518

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819466372 [0819466379]

Language:

English

Call no.:

P63600/6518

Type:

Conference Proceedings

Details

TDL ID:	ZA00046825
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Metrology, Inspection, and Process Control for Microlithography
Conf. info. (Number):	2007 : 21st
Conf. info. (Venue):	San Jose, CA, USA
Conf. info. (Date):	2007.02.26-2007.03.01

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