Realizing value-added metrology

Realizing value-added metrology

Author(s):

B. Bunday ( International SEMATECH Manufacturing Initiative (USA) )

P. Lipscomb ( International SEMATECH Manufacturing Initiative (USA) )

J. Allgair ( International SEMATECH Manufacturing Initiative (USA) )

D. Patel ( International SEMATECH Manufacturing Initiative (USA) )

M. Caldwell ( Freescale (USA) )

E. Solecky ( IBM Microelectronics (USA) )

C. Archie ( IBM Microelectronics (USA) )

J. Morningstar ( IBM Microelectronics (USA) )

B. J. Rice ( SEMATECH (USA) )

B. Singh ( Advanced Micro Devices (USA) )

J. Cain ( Advanced Micro Devices (USA) )

I. Emami ( Advanced Micro Devices (USA) )

B. Banke, Jr. ( IBM Microelectronics (USA) )

A. Herrera ( Spansion (USA) )

V. Ukraintsev ( Texas Instruments (USA) )

J. Schlessinger ( Texas Instruments (USA) )

J. Ritchison ( Texas Instruments (USA) )

12 more

Publication title:

Metrology, inspection, and process control for microlithography XXI

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6518

Pub. Year:

2007

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819466372 [0819466379]

Language:

English

Call no.:

P63600/6518

Type:

Conference Proceedings

Details

TDL ID:	ZA00046825
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Metrology, Inspection, and Process Control for Microlithography
Conf. info. (Number):	2007 : 21st
Conf. info. (Venue):	San Jose, CA, USA
Conf. info. (Date):	2007.02.26-2007.03.01

Similar Items:

1 Conference Proceedings Metrology tool fleet management: applying FMP tool matching and monitoring concepts to an overlay fleet [6152-38] Morningstar, J., Solecky, E., Archie, C., Banke, B. SPIE - The International Society of Optical Engineering	7 Conference Proceedings Correlating scatterometry to CD-SEM and electrical gate measurements at the 90-nm node using TMU analysis Sendelbach, M., Archie, C.N., Banke, B., Mayer, J., Nii, H., Herrera, P., Hankinson, M. SPIE - The International Society of Optical Engineering
2 Conference Proceedings Litho-metrology challenges for the 45-nmtechnology node and beyond (Invited Paper) [6152-12] Allgair, J. A., Bunday, B. D., Bishop, M., Lipscomb, P., Orji, N. G. SPIE - The International Society of Optical Engineering	8 Conference Proceedings Characteristics of accuracy for CD metrology G. W. Banke, Jr., Charles N. Archie SPIE - The International Society of Optical Engineering
3 Conference Proceedings Impact of sampling on uncertainty: semiconductor dimensional metrology applications B. Bunday, B. Rijpers, B. Banke, C. Archie, I. B. Peterson Society of Photo-optical Instrumentation Engineers	9 Conference Proceedings Combined use of x-ray reflectometry and spectroscopic ellipsometry for characterization of thin film optical properties [6155-25] Cain, J. P., Robie, S., Zhang, Q., Singh, B., Emami, I. SPIE - The International Society of Optical Engineering
4 Conference Proceedings The coming of age of tilt CD-SEM B. Bunday, J. Allgair, E. Solecky, C. Archie, N. G. Orji, J. Beach, O. Adan, R. Peltinov, M. Bar-zvi, J. Swyers SPIE - The International Society of Optical Engineering	10 Conference Proceedings Three-dimensional top-down metrology: a viable alternative to AFM or cross-section? Solecky,E.P., Archie,C.N., Hayes,T.S., Banke,G.W., Cornell,R.S. SPIE-The International Society for Optical Engineering
5 Conference Proceedings Reducing measurement uncertainty drives the use of multiple technologies for supporting metrology Banke, B., Archie, C.N., Sendelbach, M., Robert, J., Slinkman, J.A., Kaszuba, P., Kontra, R., DeVries, M., Solecky, E.P. SPIE - The International Society of Optical Engineering	11 Conference Proceedings New apparent beam width artifact and measurement methodology for CD-SEM resolution monitoring Mayer, J.A., Huizenga, K.J., Solecky, E.P., Archie, C.N., Banke, G.W. Jr.,, Cogley, R.M., Nathan, C., Robert, J.M. SPIE-The International Society for Optical Engineering
6 Conference Proceedings SEM metrology for advanced lithographies B. Bunday, J. Allgair, B. J. Rice, J. Byers, Y. Avitan, R. Peltinov, M. Bar-zvi, O. Adan, J. Swyers, R. Z. Shneck SPIE - The International Society of Optical Engineering	12 Conference Proceedings Calibrating optical overlay measurements [6152-37] Lipscomb, W. P. III, Allgair, J. A., Bunday, B. D., Bishop, M. R., Silver, R. M., Attota, R., Stocker, M. D. SPIE - The International Society of Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12