Fundamental limits of optical critical dimension metrology: a simulation study
- Author(s):
R. Silver ( National Institute of Standards and Technology (USA) ) T. Germer ( National Institute of Standards and Technology (USA) ) R. Attota ( National Institute of Standards and Technology (USA) ) B. M. Barnes ( National Institute of Standards and Technology (USA) ) B. Bunday ( International Sematech Manufacturing Initiative (USA) ) J. Allgair ( International Sematech Manufacturing Initiative (USA) ) E. Marx ( National Institute of Standards and Technology (USA) ) J. Jun ( National Institute of Standards and Technology (USA) ) - Publication title:
- Metrology, inspection, and process control for microlithography XXI
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6518
- Pub. Year:
- 2007
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819466372 [0819466379]
- Language:
- English
- Call no.:
- P63600/6518
- Type:
- Conference Proceedings
Similar Items:
SPIE - The International Society of Optical Engineering |
7
Conference Proceedings
Modeling the effect of line profile variation on optical critical dimension metrology
SPIE - The International Society of Optical Engineering |
2
Conference Proceedings
Model-based analysis of the limits of optical metrology with experimental comparisons
SPIE - The International Society of Optical Engineering |
8
Conference Proceedings
Progress toward traceable nanoscale optical critical dimension metrology for semiconductors
SPIE - The International Society of Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
5
Conference Proceedings
Optical through-focus technique that differentiates small changes in line width, line height. and sidewall angle for CD, overlay, and defect metrology …
Society of Photo-optical Instrumentation Engineers |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
12
Conference Proceedings
Scatterfield microscopy using back focal plane imaging with an engineered illumination field [6152-19]
SPIE - The International Society of Optical Engineering |